TY  - JOUR
U1  - Zeitschriftenartikel, wissenschaftlich - begutachtet (reviewed)
A1  - Partel, Stefan
A1  - Urban, Gerald A.
A1  - Motzek, Kristian
T1  - Simulation model validation of two common i-line photoresists
JF  - Microelectronic Engineering
KW  - AZ MiR 701
KW  - Dissolution rate monitor
KW  - DRM
KW  - Lithography simulation
KW  - Mask-Aligner
KW  - Mask-Aligner lithography simulation
KW  - Photoresist calibration
KW  - SPR 955-CM
Y1  - 2013
SN  - 0167-9317
SS  - 0167-9317
U6  - https://doi.org/10.1016/j.mee.2013.01.054
DO  - https://doi.org/10.1016/j.mee.2013.01.054
VL  - o.Jg.
IS  - Bd. 110
SP  - 75
EP  - 79
ER  -