@article{MotzekPartelBramatietal.2012,
  author    = {Kristian Motzek and Stefan Partel and Arianna Bramati and Ulrich Hofmann and Nezih Unal and Marc Hennemeyer and Michael Hornung and Alexander Heindl and Michael Ruhland and Andreas Erdmann and Peter Hudek},
  title     = {Mask aligner lithography simulation - from lithography simulation to process validation},
  series   = {Microelectronic Engineering},
  volume    = {o.Jg.},
  number    = {Bd. 98},
  issn      = {0167-9317},
  doi       = {10.1016/j.mee.2012.07.076},
  pages     = {121 -- 124},
  year      = {2012},
  language  = {en}
}