TY  - JOUR
U1  - Zeitschriftenartikel, wissenschaftlich - begutachtet (reviewed)
A1  - Motzek, Kristian
A1  - Partel, Stefan
A1  - Bramati, Arianna
A1  - Hofmann, Ulrich
A1  - Unal, Nezih
A1  - Hennemeyer, Marc
A1  - Hornung, Michael
A1  - Heindl, Alexander
A1  - Ruhland, Michael
A1  - Erdmann, Andreas
A1  - Hudek, Peter
T1  - Mask aligner lithography simulation - from lithography simulation to process validation
JF  - Microelectronic Engineering
KW  - Dissolution rate monitor
KW  - Mask aligner
KW  - Optical lithography
KW  - Photoresist
KW  - Proximity printing
Y1  - 2012
SN  - 0167-9317
SS  - 0167-9317
U6  - https://doi.org/10.1016/j.mee.2012.07.076
DO  - https://doi.org/10.1016/j.mee.2012.07.076
VL  - o.Jg.
IS  - Bd. 98
SP  - 121
EP  - 124
ER  -