@article{PartelZoppelHudeketal.2010, author = {Stefan Partel and Sandra Zoppel and Peter Hudek and Andreas Bich and Uwe Vogler and Michael Hornung and Reinhard Voelkel}, title = {Contact and proximity lithography using 193 nm Excimer laser in Mask Aligner}, series = {Microelectronic Engineering}, volume = {87. Jg.}, number = {H. 5-8: The 35th International Conference on Micro- and Nano-Engineering (MNE). Ghent, Belgium. 28 September-1 October 2009}, doi = {10.1016/j.mee.2009.11.171}, pages = {936 -- 939}, year = {2010}, language = {en} }