@inproceedings{MatayAndokBaraketal.2010,
  author    = {Ladislav Matay and Robert Andok and V. Bar{\´a}k and A. Ritomsk{\´y} and I. Konečnikova and Ivan Kostič and Stefan Partel and Peter Hudek},
  title     = {Material optimization of the alignment marks for the EBDW lithography},
  series = {8th International Conference on Advanced Semiconductor Devices Microsystems (ASDAM), 2010. 25 - 27 Oct. 2010, Smolenice Castle, Slovakia},
  editor    = {Juraj Breza},
  publisher = {IEEE Operations Center},
  address   = {Piscataway, NJ},
  doi       = {10.1109/ASDAM.2010.5666341},
  pages     = {85 -- 88},
  year      = {2010},
  language  = {en}
}