TY - JOUR U1 - Zeitschriftenartikel, wissenschaftlich - begutachtet (reviewed) A1 - Partel, Stefan A1 - Zoppel, Sandra A1 - Hudek, Peter A1 - Bich, Andreas A1 - Vogler, Uwe A1 - Hornung, Michael A1 - Voelkel, Reinhard T1 - Contact and proximity lithography using 193 nm Excimer laser in Mask Aligner JF - Microelectronic Engineering Y1 - 2010 U6 - https://doi.org/10.1016/j.mee.2009.11.171 DO - https://doi.org/10.1016/j.mee.2009.11.171 VL - 87. Jg. IS - H. 5-8: The 35th International Conference on Micro- and Nano-Engineering (MNE). Ghent, Belgium. 28 September-1 October 2009 SP - 936 EP - 939 ER -