TY  - CHAP
U1  - Buchbeitrag
A1  - Motzek, Kristian
A1  - Partel, Stefan
A1  - Vogler, Uwe
A1  - Erdmann, Andreas
ED  - Smith, Daniel G.
ED  - Wyrowski, Frank
ED  - Erdmann, Andreas
T1  - Numerical optimization of illumination and mask layout for the enlargement of process windows and for the control of photoresist profiles in proximity printing
T2  - Physical Optics. Marseille, France, 5 - 6 September 2011
Y1  - 2011
VL  - 8171
SP  - 8
S1  - 8
PB  - Society of Photo-Optical Instrumentation Engineers SPIE
CY  - Bellingham, Wash.
ER  -