@incollection{MotzekPartelVogleretal.2011,
  author    = {Kristian Motzek and Stefan Partel and Uwe Vogler and Andreas Erdmann},
  title     = {Numerical optimization of illumination and mask layout for the enlargement of process windows and for the control of photoresist profiles in proximity printing},
  series = {Physical Optics. Marseille, France, 5 - 6 September 2011},
  volume    = {8171},
  editor    = {Daniel G. Smith and Frank Wyrowski and Andreas Erdmann},
  publisher = {Society of Photo-Optical Instrumentation Engineers SPIE},
  address   = {Bellingham, Wash.},
  year      = {2011},
  language  = {en}
}