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Growth of carbon allotropes in plasma CVD system

  • Various carbon (nano-) forms, so-called allotropes, have become one of the most supporting activities in fundamental and applied research trends. Therefore, a universal deposition process capable of “adjusting” system parameters in one “deposition chamber” is highly demanding. Here, we present a low-pressure large area deposition system combining radiofrequency (RF) and microwave (MW) plasma in one chamber in different configurations, which offers a wide deposition window for the growth of sp2 carbon (carbon nanotubes, amorphous carbon), a mixture of sp2 and sp3 (diamond-like films) and pure sp3 carbon represented by diamond films. We will show that not only the type of plasma source (RF vs. MW) but also the gas mixture and plasma chemistry are crucial parameters for the controllable and reproducible growth of these allotropes at temperatures from 250 to 800 °C.

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Author:Alexander Kromka, O. Babčenko, Tibor Izsák, M. Varga, Gabriel Vanko, Johann ZehetnerORCiD, Štepan Potocký
Parent Title (English):Proceeding of the International Conference on Advances in Electronic and Photonic Technologies (ADEPT 2022): Tatranská Lomnica, Slovakia, June 20th-24th, 2022.
Publisher:EDIS-Publishing Centre of UZ
Place of publication:Žilina
Document Type:Conference Proceeding
Year of publication:2022
Release Date:2023/03/03
Tag:carbon allotropes; carbon nanotubes; diamond; dual plasma
Number of pages:4
First Page:17
Last Page:20
Organisationseinheit:Forschung / Forschungszentrum Mikrotechnik
DDC classes:600 Technik, Medizin, angewandte Wissenschaften
Publicationlist:Zehetner, Johann