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Simulation model validation of two common i-line photoresists
Author: | Stefan Partel, Gerald A. Urban, Kristian Motzek |
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DOI: | https://doi.org/10.1016/j.mee.2013.01.054 |
ISSN: | 0167-9317 |
Parent Title (English): | Microelectronic Engineering |
Document Type: | Article |
Language: | English |
Year of publication: | 2013 |
Release Date: | 2018/11/22 |
Tag: | AZ MiR 701; DRM; Dissolution rate monitor; Lithography simulation; Mask-Aligner; Mask-Aligner lithography simulation; Photoresist calibration; SPR 955-CM |
Volume: | o.Jg. |
Issue: | Bd. 110 |
First Page: | 75 |
Last Page: | 79 |
Organisationseinheit: | Forschung / Forschungszentrum Mikrotechnik |
Publicationlist: | Partel, Stefan |