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Simulation model validation of two common i-line photoresists

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Author:Stefan Partel, Gerald A. Urban, Kristian Motzek
DOI:https://doi.org/10.1016/j.mee.2013.01.054
ISSN:0167-9317
Parent Title (English):Microelectronic Engineering
Document Type:Article
Language:English
Year of publication:2013
Release Date:2018/11/22
Tag:AZ MiR 701; DRM; Dissolution rate monitor; Lithography simulation; Mask-Aligner; Mask-Aligner lithography simulation; Photoresist calibration; SPR 955-CM
Volume:o.Jg.
Issue:Bd. 110
First Page:75
Last Page:79
Organisationseinheit:Forschung / Forschungszentrum Mikrotechnik
Publicationlist:Partel, Stefan