Contact and proximity lithography using 193 nm Excimer laser in Mask Aligner
Author: | Stefan Partel, Sandra Zoppel, Peter Hudek, Andreas Bich, Uwe Vogler, Michael Hornung, Reinhard Voelkel |
---|---|
DOI: | https://doi.org/10.1016/j.mee.2009.11.171 |
Parent Title (English): | Microelectronic Engineering |
Document Type: | Article |
Language: | English |
Year of publication: | 2010 |
Release Date: | 2020/12/22 |
Volume: | 87. Jg. |
Issue: | H. 5-8: The 35th International Conference on Micro- and Nano-Engineering (MNE). Ghent, Belgium. 28 September-1 October 2009 |
First Page: | 936 |
Last Page: | 939 |
Organisationseinheit: | Forschung / Forschungszentrum Mikrotechnik |
DDC classes: | 500 Naturwissenschaften und Mathematik / 530 Physik |
Open Access?: | nein |
Peer review: | wiss. Beitrag, peer-reviewed |
Publicationlist: | Partel, Stefan |
Stroj, Sandra |