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Contact and proximity lithography using 193 nm Excimer laser in Mask Aligner

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Author:Stefan Partel, Sandra Zoppel, Peter Hudek, Andreas Bich, Uwe Vogler, Michael Hornung, Reinhard Voelkel
DOI:https://doi.org/10.1016/j.mee.2009.11.171
Parent Title (English):Microelectronic Engineering
Document Type:Article
Language:English
Year of publication:2010
Release Date:2020/12/22
Volume:87. Jg.
Issue:H. 5-8: The 35th International Conference on Micro- and Nano-Engineering (MNE). Ghent, Belgium. 28 September-1 October 2009
First Page:936
Last Page:939
Organisationseinheit:Forschung / Forschungszentrum Mikrotechnik
DDC classes:500 Naturwissenschaften und Mathematik / 530 Physik
Open Access?:nein
Peer review:wiss. Beitrag, peer-reviewed
Publicationlist:Partel, Stefan
Stroj, Sandra