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Mask aligner lithography simulation - from lithography simulation to process validation

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Author:Kristian Motzek, Stefan Partel, Arianna Bramati, Ulrich Hofmann, Nezih Unal, Marc Hennemeyer, Michael Hornung, Alexander Heindl, Michael Ruhland, Andreas Erdmann, Peter Hudek
DOI:https://doi.org/10.1016/j.mee.2012.07.076
ISSN:0167-9317
Parent Title (English):Microelectronic Engineering
Document Type:Article
Language:English
Year of publication:2012
Release Date:2018/11/22
Tag:Dissolution rate monitor; Mask aligner; Optical lithography; Photoresist; Proximity printing
Volume:o.Jg.
Issue:Bd. 98
First Page:121
Last Page:124
Organisationseinheit:Forschung / Forschungszentrum Mikrotechnik
Publicationlist:Partel, Stefan