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Microstructuring of resist double layers by a femtosecond laser ablation and UV lithography hybrid process

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Author:Tamara Pacher, Adrian Prinz, Sandra StrojORCiD, Stefan Partel
Parent Title (English):Laser-based Micro- and Nanoprocessing VIII. 4-6 February 2014. San Francisco, California, United States
Publisher:SPIE
Place of publication:Bellingham, Wash.
Editor:Udo Klotzbach, Kunihiko Washio, Craig B. Arnold
Document Type:Conference Proceeding
Language:English
Year of publication:2014
Release Date:2018/11/22
Number of pages:8
Organisationseinheit:Forschung / Forschungszentrum Mikrotechnik
Forschung / Josef Ressel Zentrum für Materialbearbeitung
Publicationlist:Partel, Stefan
Stroj, Sandra