Volltext-Downloads (blau) und Frontdoor-Views (grau)
  • search hit 1 of 2
Back to Result List

Numerical optimization of illumination and mask layout for the enlargement of process windows and for the control of photoresist profiles in proximity printing

Export metadata

Additional Services

Share in Twitter Search Google Scholar
Metadaten
Author:Kristian Motzek, Stefan Partel, Uwe Vogler, Andreas Erdmann
Parent Title (English):Physical Optics. Marseille, France, 5 - 6 September 2011
Publisher:Society of Photo-Optical Instrumentation Engineers SPIE
Place of publication:Bellingham, Wash.
Editor:Daniel G. Smith, Frank Wyrowski, Andreas Erdmann
Document Type:Part of a Book
Language:English
Year of publication:2011
Release Date:2018/11/22
Volume:8171
Number of pages:8
Organisationseinheit:Forschung / Forschungszentrum Mikrotechnik
Publicationlist:Partel, Stefan