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Numerical optimization of illumination and mask layout for the enlargement of process windows and for the control of photoresist profiles in proximity printing

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Author:Kristian Motzek, Stefan Partel, Uwe Vogler, Andreas Erdmann
Parent Title (English):Physical Optics. Marseille, France, 5 - 6 September 2011
Publisher:Society of Photo-Optical Instrumentation Engineers SPIE
Place of publication:Bellingham, Wash.
Editor:Daniel G. Smith, Frank Wyrowski, Andreas Erdmann
Document Type:Part of a Book
Year of publication:2011
Release Date:2018/11/22
Number of pages:8
Organisationseinheit:Forschung / Forschungszentrum Mikrotechnik
Publicationlist:Partel, Stefan