Numerical optimization of illumination and mask layout for the enlargement of process windows and for the control of photoresist profiles in proximity printing
Author: | Kristian Motzek, Stefan Partel, Uwe Vogler, Andreas Erdmann |
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Parent Title (English): | Physical Optics. Marseille, France, 5 - 6 September 2011 |
Publisher: | Society of Photo-Optical Instrumentation Engineers SPIE |
Place of publication: | Bellingham, Wash. |
Editor: | Daniel G. Smith, Frank Wyrowski, Andreas Erdmann |
Document Type: | Part of a Book |
Language: | English |
Year of publication: | 2011 |
Release Date: | 2018/11/22 |
Volume: | 8171 |
Number of pages: | 8 |
Organisationseinheit: | Forschung / Forschungszentrum Mikrotechnik |
Publicationlist: | Partel, Stefan |