Deutsch
Open Access
Home
Search
Browse
Publish
FAQ
Volltext-Downloads (blau) und Frontdoor-Views (grau)
Schließen
Refine
Author
Andok, Robert
(1)
Barák, V.
(1)
Haščík, Š.
(1)
Hudek, Peter
(1)
Izsák, Tibor
(1)
Konečnikova, I.
(1)
Kostič, Ivan
(1)
Kováčová, Eva
(1)
Matay, Ladislav
(1)
Partel, Stefan
(1)
+ more
Year of publication
2022
(1)
2010
(1)
Document Type
Conference Proceeding
(2)
Institute
Forschungszentrum Mikrotechnik
(2)
Language
English
(2)
Has Fulltext
no
(2)
Is part of the Bibliography
yes
(2)
Keywords
deep reactive ion etching (2)
(remove)
2
search hits
1
to
1
Export
BibTeX
CSV
Marc21
RIS
1
10
20
50
100
Material optimization of the alignment marks for the EBDW lithography
(2010)
Matay, Ladislav
;
Andok, Robert
;
Barák, V.
;
Ritomský, A.
;
Konečnikova, I.
;
Kostič, Ivan
;
Partel, Stefan
;
Hudek, Peter
1
to
1