Mask aligner lithography simulation - from lithography simulation to process validation
Author: | Kristian Motzek, Stefan Partel, Arianna Bramati, Ulrich Hofmann, Nezih Unal, Marc Hennemeyer, Michael Hornung, Alexander Heindl, Michael Ruhland, Andreas Erdmann, Peter Hudek |
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DOI: | https://doi.org/10.1016/j.mee.2012.07.076 |
ISSN: | 0167-9317 |
Parent Title (English): | Microelectronic Engineering |
Document Type: | Article |
Language: | English |
Year of publication: | 2012 |
Release Date: | 2018/11/22 |
Tag: | Dissolution rate monitor; Mask aligner; Optical lithography; Photoresist; Proximity printing |
Volume: | o.Jg. |
Issue: | Bd. 98 |
First Page: | 121 |
Last Page: | 124 |
Organisationseinheit: | Forschung / Forschungszentrum Mikrotechnik |
Publicationlist: | Partel, Stefan |