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This paper describes two different designs of 1×8 passive optical splitters. The first splitter consists of cascade arranged directional waveguide branches (Y-branch splitter) with (0.8×0.16) µm2 waveguide cross-section. The second splitter is based on multimode interference occurring in a large MMI coupler, which uses a self-imaging effect for beam propagation, exhibiting the same waveguide core size as a Y-branch splitter. The waveguide channel profile, used in both approaches, is based on a silicon nitride material platform, with a refractive index of core being nc = 1.925 and a refractive index of cladding ncl = 1.4575. The splitters are designed as a planar structure for a medical operating wavelength 850 nm. Design, simulation, and optimization of passive optical components are performed by a commercial photonic software tool BeamPROP simulation engine by RSoft Photonics Suite tool, employing beam propagation method. This work aims to find the minimum physical dimensions of the designed splitters with the satisfactory optical performance. According to the minimum insertion loss and minimum non-uniformity, the optimum length of the splitters is determined. Finally, the optical properties of splitters for both approaches are discussed and compared with each other.
Smart services disrupt business models and have the potential to stimulate the circular economy transition of regions, enabling an environmentally friendly atmosphere for sustainable and innovation-driven growth of regions. Although smart services are powerful means for deploying circular economy goals in industrial practices, there is little systematic guidance on how the adoption of smart services could improve resource efficiency and stimulate smart regional innovation-driven growth, enabled through circular design. Implemented in the scope of Vorarlberg’s smart specialization strategy, this paper contributes to the literature on the circular economy and regional innovation-driven growth by assessing critical factors of the value creation and value capture implemented within the scope of the quadruple helix system. By identifying the main challenges and opportunities of collaborative value creation and value capture in setting-up smart circular economy strategies and by assessing the role of innovation actors within the quadruple helix innovation system, the study provides recommendations and set of guidelines for managers and public authorities in managing circular transition. Finally, based on the analysis of the role of actors in creating shared value and scaling-up smart circular economy practices in the quadruple helix innovation systems, the paper investigates the role of banks as enablers of circular economy innovation-driven regional growth and smart value creation.
A new software tool, called AWG-Wuckler, is developed to calculate geometric parameters of arrayed waveguide grating structures for telecommunication and medical applications. These parameters are crucial for a AWG layout which will be created and simulated using commercial photonic design tools. The design process of AWG is very complex because its geometric dimensions depend on a large number of input design parameters and other input design parameters. Often geometric constraints require an adjustment of the input design parameters and vice versa. Calculation and adjustment of the geometric parameters is a time-consuming process that is currently not fully supported by any commercial photonic tool. AWG-Wuckler tool overcomes this issue and offers a fast and easy to use solution. The tool was already applied in various AWG designs and is technologically well proven.
Deep etched structures in GaAs with high aspect ratio have promising applications in optoelectronics and MEMS devices. The key factors in their fabrication process are the choosing of proper mask material and etching conditions which results in high selectivity and an anisotropic etch profile with smooth sidewalls. In this work, we studied several types of mask materials (Al, Ni, Cr, SiO2) for deep reactive ion etching of GaAs using inductively coupled plasma system. Thus, several sets of experiments were performed with varying gas mixture, pressure and ICP/RF power. As a result, we find optimized conditions and minimal thickness of mask material for achieving deep etched (>140 m) GaAs structures.