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Author
Bramati, Arianna
(1)
Erdmann, Andreas
(1)
Heindl, Alexander
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Hennemeyer, Marc
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Hofmann, Ulrich
(1)
Hornung, Michael
(1)
Hudek, Peter
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Motzek, Kristian
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Partel, Stefan
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Ruhland, Michael
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2012
(1)
Document Type
Article
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Forschungszentrum Mikrotechnik
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English
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Keywords
Optical lithography (1)
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Mask aligner lithography simulation - from lithography simulation to process validation
(2012)
Motzek, Kristian
;
Partel, Stefan
;
Bramati, Arianna
;
Hofmann, Ulrich
;
Unal, Nezih
;
Hennemeyer, Marc
;
Hornung, Michael
;
Heindl, Alexander
;
Ruhland, Michael
;
Erdmann, Andreas
;
Hudek, Peter
1
to
1