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Vogler, Uwe (2)
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2011
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Forschungszentrum Mikrotechnik (2)
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Contact and proximity lithography using 193 nm Excimer laser in Mask Aligner
(2010)
Partel, Stefan
;
Zoppel, Sandra
;
Hudek, Peter
;
Bich, Andreas
;
Vogler, Uwe
;
Hornung, Michael
;
Voelkel, Reinhard
Numerical optimization of illumination and mask layout for the enlargement of process windows and for the control of photoresist profiles in proximity printing
(2011)
Motzek, Kristian
;
Partel, Stefan
;
Vogler, Uwe
;
Erdmann, Andreas
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